Main Articles Atomic Layer Deposition of TiO2using Titanium Isopropoxide and H2O: Operational Principle of Equipment and Parameter Setting

Atomic Layer Deposition of TiO2using Titanium Isopropoxide and H2O: Operational Principle of Equipment and Parameter Setting

, , ,
Download Atomic Layer Deposition of TiO2using Titanium Isopropoxide and H2O: Operational Principle of Equipment and Parameter Setting article for free from OceanOfPDF
Request Code : Z-LIBIO300853
Date:
30 jun, 2016
Issue Number:
3
Publisher:
The Institute of Electronics Engineers of Korea
Issue Volume:
16
DOI:
10.5573/jsts.2016.16.3.346
Issue First Page :  
346
Issue Last Page :  
351